IEEE CASS Society Meets Industry: Breakfast with Spin-Ion Technologies

Date
Geographic Location
Zurich, Switzerland
IEEE Region
Region 08 (Africa, Europe, Middle East)

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Description

CASS Loves Industry! Europe’s Circuits and Systems community values all its members, and in 2025, the IEEE Circuits and Systems Society (CASS) is bringing industry and academia closer than ever through a series of European events. With over 10 events, 50+ talks, and 35+ speakers from 30 leading companies, this series will highlight fields such as wireless networks, biomedical systems, AI, and IoT integration.

On December 16th, 2025, kickstart your day with a breakfast and a talk by Dafiné Ravelosona, co-founder of Spin-Ion Technology.

The event is free and open to all, but registration is mandatory.

Ion-Engineered Magnetic Tunnel Junctions for MRAM, Magnetic Sensors, and Neuromorphic Computing

Dafiné Ravelosona1, 2
1Spin-Ion Technologies, 91120 Palaiseau, France
2Centre de Nanosciences et de Nanotechnologies (C2N), CNRS, University of Paris-Saclay, 91120 Palaiseau, France

Abstract: We have developed a unique manufacturing process based on He+ ion irradiation to tailor the structural properties of ultra-thin magnetic films. The key feature of the technology is the post-growth control at atomic scale of magnetic properties. When realized through a mask this technology allows lateral modulation of magnetic properties without any physical etching.

In this talk, I will demonstrate that He+ ion irradiation can be used to enhance the performance of Magnetic Tunnel Junctions with perpendicular magnetic anisotropy for application to MRAM, magnetic sensors and neuromorphic computing. In particular, I will introduce our neuromorphic chip composed of customized MRAM devices This chip can address on-chip continual learning, hence greatly advancing the development of highly efficient, robust hardware amenable to neural applications on the edge.